High-quality foam pads ideal for Professional applications
Features
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Partially closed cells are strategically patterned to drastically improve polishing performance by evenly dispersing compound/polishing onto the working surface
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Slower rate of polish absorption enhances polishing performance
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Reduced surface tension allows operator to run pad flat on the working surface with greatly minimized pad skipping
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CCS pockets gradually release compound/polish as required, resulting in increased operator control
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Reduced surface contact generates less friction and heat
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Curved edges enable easier polishing in corners and along edges
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Hook and Loop backing
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Machine wash in warm water and air dry to clean
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Available in Hard/Cutting, Medium/Polishing and Soft/Finessing densities